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Composition and electrical properties of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor Choi, J; Choi, Y; Hong, J; Tian, H; Roh, JS; Kim, Y; Chung, TM; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, pp.6852 - 6856, 2002-11 |
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