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Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning Park, Junyong; Tahk, Dongha; Ahn, Changui; Im, SungGap; Choi, Se-Jin; Suh, Khap-Yang; Jeon, Seokwoo, JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.13, pp.2316 - 2322, 2014-01 |
Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials Kim, WS; Choi, DG; Bae, Byeong-Soo, NANOTECHNOLOGY, v.17, no.13, pp.3319 - 3324, 2006-07 |
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