Showing results 1 to 4 of 4
Effect of CO and CO2 addition in CF4/O2 gas system on tungsten etching Kwon, SK; Nam, CW; Woo, Seong-Ihl, 한국화학공학회 추계학술발표회, 한국화학공학회, 1990-10 |
Effect of CO ans CO2 addition to CF4/O2 gas system on the etch rate and selectivity of W Kwon, SK; Nam, CW; Chung, IJ; Woo, Seong-Ihl, Conference on Semiconductors Materials, Component & CAD, pp.161 -, 1991 |
Effect of UV-O-2, NF3/H-2 surface preparation on the crystalline defects in silicon homoepitaxy (Part I. A study on photochemical surface preparation in series) Sun, MC; Kim, DoHyun; Kwon, SK, JOURNAL OF CRYSTAL GROWTH, v.237, no.2, pp.1399 - 1403, 2002-04 |
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03 |
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