| 1 | Characterization of Al-doped spinel LiMn2O4 thin film cathode electrodes prepared by liquid source misted chemical deposition (LSMCD) technique Kim, KW; Lee, SW; Han, KS; Chung, HJ; Woo, Seong-Ihl, ELECTROCHIMICA ACTA, v.48, no.28, pp.4223 - 4231, 2003-12 |
| 2 | Characterization of Ferroelectric Thin Films Prepared by Liquid Source Misted Chemical Deposition(LSMCD) Chung, HJ; Chung, SJ; Woo, Seong-Ihl, Workshop on Ferroelectrics and FRAM Technology, pp.41 -, 2000-01-01 |
| 3 | Characterization of Ferroelectric thin films preparred by LSMCD Chung, HJ; Woo, Seong-Ihl, The 2nd Asian Conf on CVD, pp.122 - 125, 2001-01-01 |
| 4 | Effect of lead acetate concentration on the droplet size in liquid source misled chemical deposition Moon, WS; Chung, HJ; Park, SeungBin; Woo, Seong-Ihl, THIN SOLID FILMS, v.358, no.1-2, pp.86 - 89, 2000-01 |
| 5 | Electrical characteristics of (Pb,Sr)TiO3 thin films for ultra-large-scale-integrated dynamic random access memory capacitors prepared by liquid-source misted chemical deposition Chung, HJ; Woo, Seong-Ihl, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.19, no.1, pp.275 - 280, 2001-01 |
| 6 | Electrical properties of (Bi3.5La0.5)Ti3O12 thin-films prepared by liquid source misted chemical deposition Chung, HJ; Chung, SJ; Jeon, MK; Woo, Seong-Ihl, KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.23, pp.329 - 332, 2006-03 |
| 7 | Ferroelectric properties of Bi3.25Ce0.75Ti3O12 thin films prepared by a liquid source misted chemical deposition Jeon, MK; Chung, HJ; Kim, KW; Oh, KS; Woo, Seong-Ihl, THIN SOLID FILMS, v.489, no.1-2, pp.1 - 4, 2005-10 |
| 8 | Novel (Pb,Sr)TiO3(PST) thin films for ULSI DRAM capacitor prepared by liquid source misted chemical deposition (LSMCD) Chung, HJ; Woo, Seong-Ihl, Annual Meeting of the Korean Institute of Metals and Material, pp.53 -, the Korean Institute of Metals and Material, 1999 |
| 9 | (Pb,Sr)TiO3 thin films for a ULSI DRAM capacitor prepared by liquid source misted chemical deposition Chung, HJ; Kim, JH; Woo, Seong-Ihl, CHEMISTRY OF MATERIALS, v.13, no.5, pp.1441 - 1441, 2001-05 |
| 10 | (Pb,Sr)TiO3(PST) thin films for ULSI DRAM capacitor prepared by liquid source misted chemical deposition(LSMCD) Chung, HJ; Chung, SJ; Woo, Seong-Ihl, 한국화학공학회 학술발표회 , v.5, no.2, pp.4513 -, 한국화학공학회, 2000 |
| 11 | Preparation and Characterization (Pb, Sr)TiO3 Thin films for Capacitor of ULSI DRAM by Liquid Source Misted Chemical Deposition Chung, HJ; Woo, Seong-Ihl, The 12th Symposium on Chemical Engineering Taejeon/Chungnam-Kyushu, pp.133 - 134, 1999 |
| 12 | Preparation and electrical properties of (Ba,Sr)TiO3 thin films deposited by liquid source misted chemical deposition Chung, HJ; Choi, JH; Lee, JeongYong; Woo, Seong-Ihl, THIN SOLID FILMS, v.382, no.1-2, pp.106 - 112, 2001-02 |
| 13 | Preparation and Electrical Properties of (Ba,Sr)TiO3 Thin Films Deposited by Liquid Source Misted Chemical Vapor Deposition (LSMCD) Lee, Jeong Yong; Woo, Seong-Ihl; Chung, HJ; Choi, JH, Asia Pacific Conference on Chemical Engineering 99 (APCChE99), pp.1901 - 1904, 1999-08-01 |
| 14 | Preparation and Electrical Properties of Ferroelectric Thin Films deposited by Liguid Source Misted Chemical Deposition (LSMCVD) Chung, HJ; Woo, Seong-Ihl, The 2nd CVD Symposium, pp.31 - 37, 1999 |
| 15 | Preparation of BST thin films on Pt electrode on Si wafer with down-flow LSMCVD reactor Chung, HJ; Kim, JH; Moon, WS; Park, SeungBin; Hwang, CS; Lee, MY; Woo, Seong-Ihl, 3rd Pacific Rim conference on the Applications of Ferroelectric Materials, pp.59 - 62, 1996 |
| 16 | Preparation of BST thin films on Pt electrode on Si wafer with down-flow LSMCVD reactor Chung, HJ; Kim, JH; Moon, WS; Park, SeungBin; Hwang, SC; Lee, MY; Woo, Seong-Ihl, INTEGRATED FERROELECTRICS, v.12, no.2-4, pp.185 - 197, 1996 |
