DSpace at KOASAS
College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Optical properties of a-Si films for 157 nm lithography

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 346
  • Download : 0
Export
Kim, S / Kim, Y / Kang, M / Sohn, J / No, Kwangsooresearcher
Issue Date
2003-04-16
Language
ENG
Citation

Photomask and Next-Generation Lithography Mask Technology X, v.5130, pp.127 - 135

URI
http://hdl.handle.net/10203/150034
Appears in Collection
MS-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

Display Full Item Record

qr_code

  • mendeley

    citeulike

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.


rss_1.0 rss_2.0 atom_1.0