DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, S | - |
dc.contributor.author | Kim, Y | - |
dc.contributor.author | Kang, M | - |
dc.contributor.author | Sohn, J | - |
dc.contributor.author | No, Kwangsoo | - |
dc.date.accessioned | 2013-03-18T16:06:57Z | - |
dc.date.available | 2013-03-18T16:06:57Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-04-16 | - |
dc.identifier.citation | Photomask and Next-Generation Lithography Mask Technology X, v.5130, no., pp.127 - 135 | - |
dc.identifier.uri | http://hdl.handle.net/10203/150034 | - |
dc.language | ENG | - |
dc.title | Optical properties of a-Si films for 157 nm lithography | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0942301035 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 5130 | - |
dc.citation.beginningpage | 127 | - |
dc.citation.endingpage | 135 | - |
dc.citation.publicationname | Photomask and Next-Generation Lithography Mask Technology X | - |
dc.identifier.conferencecountry | Japan | - |
dc.identifier.conferencecountry | Japan | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Kim, S | - |
dc.contributor.nonIdAuthor | Kim, Y | - |
dc.contributor.nonIdAuthor | Kang, M | - |
dc.contributor.nonIdAuthor | Sohn, J | - |
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