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Showing results 1 to 9 of 9

1
Cluster tool design comparisons via simulation

Park, Kyungsu; Morrison, James R, 7th International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM), Winter Simulation Conference, pp.1877 - 1887, MASM, 2011-12

2
Control of wafer release in multi cluster tools

Park, Kyungsu; Morrison, James R, 8th IEEE International Conference on Control and Automation, pp.1481 - 1487, ICCA, 2010-06

3
Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic

Park, Kyungsu; Morrison, James R, IEEE TRANSACTIONS ON AUTOMATION SCIENCE AND ENGINEERING, v.12, no.2, pp.642 - 655, 2015-04

4
Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation

Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.1, pp.39 - 51, 2017-02

5
Models of Clustered Photolithography Tools for Fab-Level Simulation: From Affine to Flow Line

Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.4, pp.547 - 558, 2017-11

6
Performance bounds for hybrid flow lines: Fundamental behavior, practical features and application to linear cluster tools

Park, Kyungsu; Morrison, James R, 8th IEEE International Conference on Automation Science and Engineering , IEEE CASE, 2012-08

7
Performance evaluation of deterministic flow lines: Redundant modules and application to semiconductor manufacturing equipment

Park, Kyungsu; Morrison, James R, 6th Annual IEEE Conference on Automation Science and Engineering , pp.45 - 50, IEEE CASE, 2010-08

8
Performance models for dual-arm cluster tools

Park, Kyungsu; Ahn, Younghun; Morrison, James R, 2011 World Congress on Intelligent Control and Automation, WCICA, 2011-06

9
Wafer admission control for clustered photolithography tools

Park, Kyungsu; Morrison, James R, Advanced Semiconductor Manufacturing Conference , pp.220 - 225, ASMC, 2010-07

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