An investigation of silicon oxide thin film by atomic layer deposition

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Issue Date
2004-04-13
Language
ENG
Citation

Amorphous and Nanocrystalline Silicon Science and Technology - 2004, v.808, pp.413 - 417

ISSN
0272-9172
URI
http://hdl.handle.net/10203/144071
Appears in Collection
MS-Conference Papers(학술회의논문)
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