An investigation of silicon oxide thin film by atomic layer deposition

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dc.contributor.authorLee, JH-
dc.contributor.authorHan, CH-
dc.contributor.authorKim, UJ-
dc.contributor.authorPark, Chong-Ook-
dc.contributor.authorRha, SK-
dc.contributor.authorLee, WJ-
dc.date.accessioned2013-03-18T02:42:21Z-
dc.date.available2013-03-18T02:42:21Z-
dc.date.created2012-02-06-
dc.date.issued2004-04-13-
dc.identifier.citationAmorphous and Nanocrystalline Silicon Science and Technology - 2004, v.808, no., pp.413 - 417-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/10203/144071-
dc.languageENG-
dc.titleAn investigation of silicon oxide thin film by atomic layer deposition-
dc.typeConference-
dc.identifier.scopusid2-s2.0-12744277383-
dc.type.rimsCONF-
dc.citation.volume808-
dc.citation.beginningpage413-
dc.citation.endingpage417-
dc.citation.publicationnameAmorphous and Nanocrystalline Silicon Science and Technology - 2004-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorPark, Chong-Ook-
dc.contributor.nonIdAuthorLee, JH-
dc.contributor.nonIdAuthorHan, CH-
dc.contributor.nonIdAuthorKim, UJ-
dc.contributor.nonIdAuthorRha, SK-
dc.contributor.nonIdAuthorLee, WJ-
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MS-Conference Papers(학술회의논문)
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