DC Field | Value | Language |
---|---|---|
dc.contributor.author | Woo, Seong-Ihl | - |
dc.contributor.author | Kim, KW | - |
dc.contributor.author | Jeon, MK | - |
dc.contributor.author | Oh, KS | - |
dc.contributor.author | Kim, TS | - |
dc.contributor.author | Park, YK | - |
dc.contributor.author | Choi, WC | - |
dc.date.accessioned | 2013-03-17T04:01:04Z | - |
dc.date.available | 2013-03-17T04:01:04Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-01 | - |
dc.identifier.citation | 2nd combinatorial & high throughput materials science in gordon conference, v., no., pp.25 - 30 | - |
dc.identifier.uri | http://hdl.handle.net/10203/139619 | - |
dc.language | ENG | - |
dc.title | Characterization of (Bi, Ce, La)4Ti3O12 thin film ofr FRAM capacitor prepared by combinatorial liquid source misted chemical deposition (LSMCD) process | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 25 | - |
dc.citation.endingpage | 30 | - |
dc.citation.publicationname | 2nd combinatorial & high throughput materials science in gordon conference | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Woo, Seong-Ihl | - |
dc.contributor.nonIdAuthor | Kim, KW | - |
dc.contributor.nonIdAuthor | Jeon, MK | - |
dc.contributor.nonIdAuthor | Oh, KS | - |
dc.contributor.nonIdAuthor | Kim, TS | - |
dc.contributor.nonIdAuthor | Park, YK | - |
dc.contributor.nonIdAuthor | Choi, WC | - |
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