DSpace at KOASAS: ECRPECVD법으로 증착한 SiOF박막의 잔류응력 안정화에 관한 연구A study on the stabilization of residual stress in SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

ECRPECVD법으로 증착한 SiOF박막의 잔류응력 안정화에 관한 연구A study on the stabilization of residual stress in SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

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최시경 researcher / 김석필 / 박영수 / 정일섭

Issue Date: 2000

Language: KOR

Citation: 한국요업학회, pp.192 -

URI: http://hdl.handle.net/10203/136366

Appears in Collection: MS-Conference Papers(학술회의논문)

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ECRPECVD법으로 증착한 SiOF박막의 잔류응력 안정화에 관한 연구A study on the stabilization of residual stress in SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

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