ECRPECVD법으로 증착한 SiOF박막의 잔류응력 안정화에 관한 연구A study on the stabilization of residual stress in SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최시경 | - |
| dc.contributor.author | 김석필 | - |
| dc.contributor.author | 박영수 | - |
| dc.contributor.author | 정일섭 | - |
| dc.date.accessioned | 2013-03-16T22:03:37Z | - |
| dc.date.available | 2013-03-16T22:03:37Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2000 | - |
| dc.identifier.citation | 한국요업학회, v., no., pp.192 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/136366 | - |
| dc.language | KOR | - |
| dc.title | ECRPECVD법으로 증착한 SiOF박막의 잔류응력 안정화에 관한 연구A study on the stabilization of residual stress in SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 192 | - |
| dc.citation.publicationname | 한국요업학회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 최시경 | - |
| dc.contributor.nonIdAuthor | 김석필 | - |
| dc.contributor.nonIdAuthor | 박영수 | - |
| dc.contributor.nonIdAuthor | 정일섭 | - |
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