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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Graded-IrO2 Diffusion Barrier를 사용한 (Ba,Sr)TiO3 커패시터용 하부 전극 구조

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이희철researcher / 차선용
Issue Date
2000
Language
KOR
Citation

제 7회 한국반도체 학술대회, pp.341 - 342

URI
http://hdl.handle.net/10203/135856
Appears in Collection
EE-Conference Papers(학술회의논문)
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