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College of Engineering(공과대학)Dept. of Chemical and Biomolecular Engineering(생명화학공학과)CBE-Journal Papers(저널논문)

2D nano/micro hybrid patterning using soft/block copolymer lithography

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dc.contributor.authorChoi, DGko
dc.contributor.authorYu, HKko
dc.contributor.authorYang, Seung-Manko
dc.date.accessioned2009-11-17T02:42:02Z-
dc.date.available2009-11-17T02:42:02Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-01-
dc.identifier.citationMATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, v.24, no.1-2, pp.213 - 216-
dc.identifier.issn0928-4931-
dc.identifier.urihttp://hdl.handle.net/10203/12711-
dc.description.abstractIn this work, we fabricated various 2D hybrid patterns with the feature resolution from micrometer to nanometer scale by using soft lithography and block copolymer lithography. Composite molds for the high-resolution with feature sizes from 135 nm to 50 mum were composed of a hard layer supported by soft PDMS layer. Polymer (PU) replica holes were made from the composite mold by replica molding. Block copolymers (PS-b-PMMA and PS-b-PI) were used as ink materials for the pattern smaller than 100 nm. UV and ozone etching was used for the selective removal of one block in the block copolymer. (C) 2003 Elsevier B.V. All rights reserved.-
dc.description.sponsorshipThis work was supported by the Brain Korea 21 program, the IMT-2000 program and a grant (M102KN010001- 02K1401-00212) from Center for Nanoscale Mechatronics and Manufacturing of 21st Century Frontier Research Program.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherELSEVIER SCIENCE BV-
dc.subjectARRAYS-
dc.title2D nano/micro hybrid patterning using soft/block copolymer lithography-
dc.typeArticle-
dc.identifier.wosid000187969700049-
dc.identifier.scopusid2-s2.0-0346216059-
dc.type.rimsART-
dc.citation.volume24-
dc.citation.issue1-2-
dc.citation.beginningpage213-
dc.citation.endingpage216-
dc.citation.publicationnameMATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Seung-Man-
dc.contributor.nonIdAuthorChoi, DG-
dc.contributor.nonIdAuthorYu, HK-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthor2D hybrid patterns-
dc.subject.keywordAuthorsoft lithography-
dc.subject.keywordAuthorblock copolymer lithography-
dc.subject.keywordPlusARRAYS-
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