Nanomachining by colloidal lithography

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Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which. are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion. etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2006-04
Language
English
Article Type
Review
Keywords

MONODISPERSE SILICA PARTICLES; ENHANCED RAMAN-SCATTERING; ALIGNED CARBON NANOTUBES; MODEL FILLED POLYMERS; PERIODIC NANOPILLAR ARRAYS; EDGE-SPREADING LITHOGRAPHY; SURFACE-PLASMON RESONANCE; NANOSPHERE LITHOGRAPHY; ELECTRIC-FIELD; DISPERSION POLYMERIZATION

Citation

SMALL, v.2, no.4, pp.458 - 475

ISSN
1613-6810
DOI
10.1002/smll.200500390
URI
http://hdl.handle.net/10203/12657
Appears in Collection
CBE-Journal Papers(저널논문)
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