Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group
- Publisher
- Proceedings of SPIE
- Issue Date
- 1999-01
- Language
- ENG
- Citation
SPIE-The International Society for Optical Engineering, pp.420 - 428
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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