DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | - |
dc.contributor.author | Kim, Hyun-Woo | - |
dc.date.accessioned | 2013-03-16T01:28:03Z | - |
dc.date.available | 2013-03-16T01:28:03Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1999-01 | - |
dc.identifier.citation | SPIE-The International Society for Optical Engineering, v., no., pp.420 - 428 | - |
dc.identifier.uri | http://hdl.handle.net/10203/126021 | - |
dc.language | ENG | - |
dc.publisher | Proceedings of SPIE | - |
dc.title | Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 420 | - |
dc.citation.endingpage | 428 | - |
dc.citation.publicationname | SPIE-The International Society for Optical Engineering | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Kim, Hyun-Woo | - |
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