Study of adsorption and decomposition of H2O on Ge(100)

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The adsorption and decomposition of water on Ge(100) have been investigated using real-time scanning tunneling microscopy (STM) and density-functional theory (DFr) calculations. The STM results revealed two distinct adsorption features of H2O on Ge(100) corresponding to molecular adsorption and H-OH dissociative adsorption. In the molecular adsorption geometry, H2O, molecules are bound to the surface via Ge-O dative bonds between the O atom of H2O and the electrophillic down atom of the Ge dimer. In the dissociative adsorption geometry, the H,,O molecule dissociates into H and OH, which bind covalently to a Ge-Ge dimer on Ge(100) in an H-Ge-Ge-OH configuration. The DFF calculations showed that the dissociative adsorption geometry is more stable than the molecular adsorption geometry. This finding is consistent with the STM results, which showed that the dissociative product becomes dominant as the H2O coverage is increased. The simulated STM images agreed very well with the experimental images. In the real-time STM experiments, we also observed a structural transformation of the H2O molecule from the molecular adsorption to the dissociative adsorption geometry.
Publisher
AMER CHEMICAL SOC
Issue Date
2005-12
Language
English
Article Type
Article
Keywords

INITIAL H2O-INDUCED OXIDATION; SCANNING-TUNNELING-MICROSCOPY; DENSITY-FUNCTIONAL THEORY; DISSOCIATIVE ADSORPTION; SI(100)-2 X-1; SURFACE; WATER; SPECTROSCOPY; SI(001); 1ST-PRINCIPLES

Citation

JOURNAL OF PHYSICAL CHEMISTRY B, v.109, no.51, pp.24445 - 24449

ISSN
1520-6106
DOI
10.1021/jp054415o
URI
http://hdl.handle.net/10203/11318
Appears in Collection
CH-Journal Papers(저널논문)
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