Study of adsorption and decomposition of H2O on Ge(100)

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dc.contributor.authorJung, SJko
dc.contributor.authorLee, JYko
dc.contributor.authorHong, Sko
dc.contributor.authorKim, Sehunko
dc.date.accessioned2009-09-18T05:30:52Z-
dc.date.available2009-09-18T05:30:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2005-12-
dc.identifier.citationJOURNAL OF PHYSICAL CHEMISTRY B, v.109, no.51, pp.24445 - 24449-
dc.identifier.issn1520-6106-
dc.identifier.urihttp://hdl.handle.net/10203/11318-
dc.description.abstractThe adsorption and decomposition of water on Ge(100) have been investigated using real-time scanning tunneling microscopy (STM) and density-functional theory (DFr) calculations. The STM results revealed two distinct adsorption features of H2O on Ge(100) corresponding to molecular adsorption and H-OH dissociative adsorption. In the molecular adsorption geometry, H2O, molecules are bound to the surface via Ge-O dative bonds between the O atom of H2O and the electrophillic down atom of the Ge dimer. In the dissociative adsorption geometry, the H,,O molecule dissociates into H and OH, which bind covalently to a Ge-Ge dimer on Ge(100) in an H-Ge-Ge-OH configuration. The DFF calculations showed that the dissociative adsorption geometry is more stable than the molecular adsorption geometry. This finding is consistent with the STM results, which showed that the dissociative product becomes dominant as the H2O coverage is increased. The simulated STM images agreed very well with the experimental images. In the real-time STM experiments, we also observed a structural transformation of the H2O molecule from the molecular adsorption to the dissociative adsorption geometry.-
dc.description.sponsorshipthe Brain Korea 21 Project, the SRC program (Center for Nanotubes and Nanostructured Composites) of MOST/KOSEF, the National R&D Project for Nano Science and Technology, and Grants for Basic Research from the Korea Research Foundation.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER CHEMICAL SOC-
dc.subjectINITIAL H2O-INDUCED OXIDATION-
dc.subjectSCANNING-TUNNELING-MICROSCOPY-
dc.subjectDENSITY-FUNCTIONAL THEORY-
dc.subjectDISSOCIATIVE ADSORPTION-
dc.subjectSI(100)-2 X-1-
dc.subjectSURFACE-
dc.subjectWATER-
dc.subjectSPECTROSCOPY-
dc.subjectSI(001)-
dc.subject1ST-PRINCIPLES-
dc.titleStudy of adsorption and decomposition of H2O on Ge(100)-
dc.typeArticle-
dc.identifier.wosid000234259900033-
dc.identifier.scopusid2-s2.0-30344455613-
dc.type.rimsART-
dc.citation.volume109-
dc.citation.issue51-
dc.citation.beginningpage24445-
dc.citation.endingpage24449-
dc.citation.publicationnameJOURNAL OF PHYSICAL CHEMISTRY B-
dc.identifier.doi10.1021/jp054415o-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Sehun-
dc.contributor.nonIdAuthorJung, SJ-
dc.contributor.nonIdAuthorLee, JY-
dc.contributor.nonIdAuthorHong, S-
dc.type.journalArticleArticle-
dc.subject.keywordPlusINITIAL H2O-INDUCED OXIDATION-
dc.subject.keywordPlusSCANNING-TUNNELING-MICROSCOPY-
dc.subject.keywordPlusDENSITY-FUNCTIONAL THEORY-
dc.subject.keywordPlusDISSOCIATIVE ADSORPTION-
dc.subject.keywordPlusSI(100)-2 X-1-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusWATER-
dc.subject.keywordPlusSPECTROSCOPY-
dc.subject.keywordPlusSI(001)-
dc.subject.keywordPlus1ST-PRINCIPLES-
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