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Showing results 1 to 14 of 14

1
Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10

2
Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, Journal of Photopolymer Science and Technology, pp.629 - 634, 2000-01

3
Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography

Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27

4
Chemically amplified resists based on methacrylate polymers with cholic acid derivatives

Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04

5
Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives

Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000

6
Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists

Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10

7
Evaluation of Reactivity Ratios of Monomers in the Copolymerization of t-Butyl 3a-Methacryloyloxy-7a-Dihydroxy-5a-Cholan-24-oate and Maleic Anhydride

Kim, Jin-Baek; Ko, Jong-Sung; Lee, Bum Wook; Yun, Hyo-Jin, 한국고분자학회 2000년 춘계학술대회 , pp.68 - 68, 한국고분자학회, 2000

8
Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists

Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04

9
New Class of Cholate-based Dissolution Inhibitor with Etch Resistance

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10

10
Novel molecular resists based on inclusion complex of cyclodextrin

Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04

11
Photobleachable silicon-containing molecular resist for deep UV lithography

Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006

12
Polymeric and molecular resists for short wavelength lithography = 단파장 리소그라피용 고분자 및 분자 레지스트link

Yun, Hyo-Jin; 윤효진; et al, 한국과학기술원, 2002

13
Silicon Containing Bilayer Resist

Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10

14
The effects of functional group on cross-linking and shelf life of resists

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2000년 춘계학술대회, 한국고분자학회, 2000-04

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