Charaterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reative Ion Etching
- Issue Date
- 1990
- Language
- ENG
- Citation
Proc. Mater. Res. Soc, v.158, pp.431 -
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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