Charaterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reative Ion Etching
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Jeong Yong | - |
| dc.contributor.author | Yun, SJ | - |
| dc.contributor.author | Jeon, YJ | - |
| dc.date.accessioned | 2013-03-14T05:34:20Z | - |
| dc.date.available | 2013-03-14T05:34:20Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990 | - |
| dc.identifier.citation | Proc. Mater. Res. Soc, v.158, no., pp.431 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/105729 | - |
| dc.language | ENG | - |
| dc.title | Charaterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reative Ion Etching | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.volume | 158 | - |
| dc.citation.beginningpage | 431 | - |
| dc.citation.publicationname | Proc. Mater. Res. Soc | - |
| dc.contributor.localauthor | Lee, Jeong Yong | - |
| dc.contributor.nonIdAuthor | Yun, SJ | - |
| dc.contributor.nonIdAuthor | Jeon, YJ | - |
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