Top-Down Processed Silicon Nanowires for Thermoelectric Applications

Cited 6 time in webofscience Cited 0 time in scopus
  • Hit : 474
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorJang, Moongyuko
dc.contributor.authorPark, Youngsamko
dc.contributor.authorHyun, Younghoonko
dc.contributor.authorJun, Myungsimko
dc.contributor.authorChoi, Sung-Jinko
dc.contributor.authorZyung, Taehyungko
dc.contributor.authorKim, Jong-Daeko
dc.date.accessioned2013-03-13T02:40:13Z-
dc.date.available2013-03-13T02:40:13Z-
dc.date.created2012-08-23-
dc.date.created2012-08-23-
dc.date.issued2012-04-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.4, pp.3552 - 3554-
dc.identifier.issn1533-4880-
dc.identifier.urihttp://hdl.handle.net/10203/104273-
dc.description.abstract50 nm wide n-type silicon nanowires have been manufactured by using a top-down process in order to investigate the thermoelectric properties of silicon nanowire. Nanowire test structures with platinum heaters and temperature sensors were fabricated. The extracted temperature coefficient of resistance (TCR) of the temperature sensors was 786.6 PPM/K. Also, the extracted Seebeck coefficient and power factor of the 50 nm wide phosphorus doped n-type silicon nanowires were -118 mu V/K and 2.16 mW.K-2.m(-1).-
dc.languageEnglish-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.subjectFIGURE-
dc.subjectMERIT-
dc.titleTop-Down Processed Silicon Nanowires for Thermoelectric Applications-
dc.typeArticle-
dc.identifier.wosid000305850900117-
dc.identifier.scopusid2-s2.0-84863303265-
dc.type.rimsART-
dc.citation.volume12-
dc.citation.issue4-
dc.citation.beginningpage3552-
dc.citation.endingpage3554-
dc.citation.publicationnameJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.identifier.doi10.1166/jnn.2012.5580-
dc.contributor.localauthorChoi, Sung-Jin-
dc.contributor.nonIdAuthorJang, Moongyu-
dc.contributor.nonIdAuthorPark, Youngsam-
dc.contributor.nonIdAuthorHyun, Younghoon-
dc.contributor.nonIdAuthorJun, Myungsim-
dc.contributor.nonIdAuthorZyung, Taehyung-
dc.contributor.nonIdAuthorKim, Jong-Dae-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorSilicon Nanowire-
dc.subject.keywordAuthorTop-Down Process-
dc.subject.keywordAuthorThermoelectricity-
dc.subject.keywordAuthorSeebeck Coefficient-
dc.subject.keywordPlusFIGURE-
dc.subject.keywordPlusMERIT-
Appears in Collection
RIMS Journal Papers
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 6 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0