Amorphous InGaZnO4 films: Gas sensor response and stability

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dc.contributor.authorYang, Dae Jinko
dc.contributor.authorWhitfield, George C.ko
dc.contributor.authorCho, Nam Gyuko
dc.contributor.authorCho, Pyeong-Seokko
dc.contributor.authorKim, Il-Dooko
dc.contributor.authorSaltsburg, Howard M.ko
dc.contributor.authorTuller, Harry L.ko
dc.date.accessioned2013-03-12T16:52:50Z-
dc.date.available2013-03-12T16:52:50Z-
dc.date.created2012-10-29-
dc.date.created2012-10-29-
dc.date.issued2012-08-
dc.identifier.citationSENSORS AND ACTUATORS B-CHEMICAL, v.171, pp.1166 - 1171-
dc.identifier.issn0925-4005-
dc.identifier.urihttp://hdl.handle.net/10203/102921-
dc.description.abstractThe response characteristics of amorphous-InGaZnO4 (a-IGZO(4)) thin films toward reducing/oxidizing gases (H-2/NO2), at sensor operating temperatures, are reported for the first time. The lack of grain boundaries eliminates a major source of electrical, microstructural and chemical inhomogeneities associated with polycrystalline semiconducting metal oxides (SMOs), rendering a-IGZO(4) a highly promising model sensor system. Gas sensor tests were carried out in the temperature range of 200-400 degrees C by monitoring changes in DC resistance during cyclic exposure to trace concentrations (between 1.25 and 50 ppm) of H-2 or NO2 in dry air. The response (S) to H-2 was found to go through a temperature maximum (e.g. S similar to 0.7 at 350 degrees C for pH(2) = 12.5 ppm) that value being a function of pH(2). The response to NO2, on the other hand, decreased with increasing temperatures with the highest recorded values at 200 degrees C (e.g. S similar to 33 at 200 degrees C for pNO(2) = 5 ppm). The response followed an approximate power law dependence on gas partial pressure (p), S = Ap(beta), with beta taking on values of similar to 0.5-1.0 as temperature increased from 200 to 400 degrees C. Response times were found to range from 10 s to greater than 1000 s as temperature decreased. The hysteretic behavior exhibited by a-IGZO films between 150 and 400 degrees C, under temperature sweep conditions, is attributed to kinetically limited adsorption/desorption and reaction rates. (C) 2012 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectOXIDE SEMICONDUCTORS-
dc.subjectGRAIN-SIZE-
dc.subjectSENSITIVITY-
dc.subjectTRANSISTORS-
dc.subjectATMOSPHERE-
dc.subjectSURFACE-
dc.subjectLAYERS-
dc.subjectMODEL-
dc.titleAmorphous InGaZnO4 films: Gas sensor response and stability-
dc.typeArticle-
dc.identifier.wosid000308572700154-
dc.identifier.scopusid2-s2.0-84864276859-
dc.type.rimsART-
dc.citation.volume171-
dc.citation.beginningpage1166-
dc.citation.endingpage1171-
dc.citation.publicationnameSENSORS AND ACTUATORS B-CHEMICAL-
dc.identifier.doi10.1016/j.snb.2012.06.057-
dc.contributor.localauthorKim, Il-Doo-
dc.contributor.nonIdAuthorYang, Dae Jin-
dc.contributor.nonIdAuthorWhitfield, George C.-
dc.contributor.nonIdAuthorCho, Nam Gyu-
dc.contributor.nonIdAuthorCho, Pyeong-Seok-
dc.contributor.nonIdAuthorSaltsburg, Howard M.-
dc.contributor.nonIdAuthorTuller, Harry L.-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorSemiconducting metal oxides-
dc.subject.keywordAuthorHydrogen gas sensor-
dc.subject.keywordAuthorNOx gas sensor-
dc.subject.keywordAuthorAmorphous semiconductor-
dc.subject.keywordPlusOXIDE SEMICONDUCTORS-
dc.subject.keywordPlusGRAIN-SIZE-
dc.subject.keywordPlusSENSITIVITY-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordPlusATMOSPHERE-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusLAYERS-
dc.subject.keywordPlusMODEL-
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