DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Seung-Woo | ko |
dc.contributor.author | Kang, Hong-Suk | ko |
dc.contributor.author | Park, Jung-Ki | ko |
dc.date.accessioned | 2013-03-12T04:58:35Z | - |
dc.date.available | 2013-03-12T04:58:35Z | - |
dc.date.created | 2012-06-01 | - |
dc.date.created | 2012-06-01 | - |
dc.date.issued | 2012-04 | - |
dc.identifier.citation | ADVANCED MATERIALS, v.24, no.16, pp.2069 - 2103 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | http://hdl.handle.net/10203/101377 | - |
dc.description.abstract | This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post-treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications. | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | SURFACE-RELIEF GRATINGS | - |
dc.subject | SIDE-CHAIN POLYMER | - |
dc.subject | SCANNING PROBE LITHOGRAPHY | - |
dc.subject | SELF-ASSEMBLED MONOLAYERS | - |
dc.subject | AZO-POLYMER | - |
dc.subject | BLOCK-COPOLYMER | - |
dc.subject | COLLOIDAL SPHERES | - |
dc.subject | NEAR-FIELD | - |
dc.subject | LARGE-AREA | - |
dc.subject | PHOTOINDUCED ANISOTROPY | - |
dc.title | Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials | - |
dc.type | Article | - |
dc.identifier.wosid | 000302904800002 | - |
dc.identifier.scopusid | 2-s2.0-84860335297 | - |
dc.type.rims | ART | - |
dc.citation.volume | 24 | - |
dc.citation.issue | 16 | - |
dc.citation.beginningpage | 2069 | - |
dc.citation.endingpage | 2103 | - |
dc.citation.publicationname | ADVANCED MATERIALS | - |
dc.identifier.doi | 10.1002/adma.201104826 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Park, Jung-Ki | - |
dc.type.journalArticle | Review | - |
dc.subject.keywordAuthor | directional photofluidization | - |
dc.subject.keywordAuthor | azobenzene | - |
dc.subject.keywordAuthor | micro | - |
dc.subject.keywordAuthor | nanofabrication | - |
dc.subject.keywordAuthor | soft lithography | - |
dc.subject.keywordAuthor | plasmonics | - |
dc.subject.keywordPlus | SURFACE-RELIEF GRATINGS | - |
dc.subject.keywordPlus | SIDE-CHAIN POLYMER | - |
dc.subject.keywordPlus | SCANNING PROBE LITHOGRAPHY | - |
dc.subject.keywordPlus | SELF-ASSEMBLED MONOLAYERS | - |
dc.subject.keywordPlus | AZO-POLYMER | - |
dc.subject.keywordPlus | BLOCK-COPOLYMER | - |
dc.subject.keywordPlus | COLLOIDAL SPHERES | - |
dc.subject.keywordPlus | NEAR-FIELD | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | PHOTOINDUCED ANISOTROPY | - |
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