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Effects of Al Precursors on the Characteristics of Indium-Aluminum Oxide Semiconductor Grown by Plasma-Enhanced Atomic Layer Deposition Lee, Seunghee; Kim, Miso; Mun, Geumbi; Ko, Jongbeom; Yeom, Hye-In; Lee, Gwang-Heum; Shong, Bonggeun; et al, ACS APPLIED MATERIALS & INTERFACES, v.13, no.33, pp.40134 - 40144, 2021-08 |
Study on the characteristics of aluminuim thin films prepared by atomic layer deposition Sang-Won Kang, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.20, no.6, pp.1983 - 1988, 2002-11 |
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