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Svnthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyirnide having an o-nitrobenzyl ether group Shin, GJ; Jung, JC; Chi, JH; Oh, TH; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.45, no.5, pp.776 - 788, 2007-03 |
Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)] Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07 |
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