Nanoscale Electronics: Digital Fabrication by Direct Femtosecond Laser Processing of Metal Nanoparticles

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A digital, direct nanoscale metal patterning method is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a photolithography mask. This method is expected to be a potential alternative to the conventional electron beam lithography method for arbitrary nanoscale direct patterning in single-step, low-temperature, and non-vacuum environments.
Publisher
WILEY-BLACKWELL
Issue Date
2011-07
Language
English
Article Type
Article
Keywords

LITHOGRAPHY-FREE; RESOLUTION; SIZE; SUBSTRATE; PARTICLES; ARRAYS

Citation

ADVANCED MATERIALS, v.23, no.28, pp.3176 - 3176

ISSN
0935-9648
DOI
10.1002/adma.201100717
URI
http://hdl.handle.net/10203/98854
Appears in Collection
EE-Journal Papers(저널논문)ME-Journal Papers(저널논문)
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