High-Throughput Near-Field Optical Nanoprocessing of Solution-Deposited Nanoparticles

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The application of nanoscale electrical and biological devices will benefit from the development of nanomanufacturing technologies that are highthroughput, low-cost, and flexible. Utilizing nanomaterials as building blocks and organizing them in a rational way constitutes an attractive approach towards this goal and has been pursued for the past few years. The optical near-field nanoprocessing of nanoparticles for high-throughput nanomanufacturing is reported. The method utilizes fluidically assembled micro,spheres as a near-field optical confinement structure array for laserassisted nanosintering and nanoablation of nanoparticles. By taking advantage of the low processing temperature and reduced thermal diffusion in the nanoparticle film, a minimum feature size down to approximate to 100 nm is realized. In addition, smaller features (50 nm) are obtained by furnace annealing of laser-sintered nanodots at 400 degrees C. The electrical conductivity of sintered nanolines is also studied. Using nanoline electrodes separated by a submicrometer gap, organic field-effect transistors are subsequently fabricated with oxygen-stable semiconducting polymer.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2010-08
Language
English
Article Type
Article
Keywords

A-SIO2 MICROSPHERES; ARRAYS; LITHOGRAPHY; RESOLUTION; SILICON; NANOLITHOGRAPHY; FABRICATION; MONOLAYERS; NANOSCALE; FUTURE

Citation

SMALL, v.6, no.16, pp.1812 - 1821

ISSN
1613-6810
DOI
10.1002/smll.201000345
URI
http://hdl.handle.net/10203/98775
Appears in Collection
ME-Journal Papers(저널논문)
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