Sputtering of Fe(100) due to low-energy ion bombardments: Molecular dynamics simulation
Molecular dynamics simulations were carried out to investigate the sputtering of Fe(l 0 0) due to low-energy (<= 10 keV)Ar ion bombardments. Bohr potentials fitted to the results of ab initio calculations for diatomic pairs (Ar-Fe, Fe-Fe) were used as the repulsive screened Coulombic potentials in sputtering simulations. The sputter yields predicted by molecular dynamics were in good accordance with the available experimental data. The threshold energy for sputtering, distributions of kinetic energies of sputtered atoms and their depth of origins could also be obtained. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Issue Date
- 2006-12
- Language
- English
- Article Type
- Article
- Keywords
SURFACES; METALS; YIELDS; FILMS; FE; POTENTIALS; COMPUTER; ARGON; SPIN; AR
- Citation
SCRIPTA MATERIALIA, v.55, no.11, pp.1043 - 1046
- ISSN
- 1359-6462
- Appears in Collection
- CBE-Journal Papers(저널논문)
- Files in This Item
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