A new monolithic thermal inkjet printhead using single crystalline silicon island as a heating resistor isolated by oxidized porous silicon

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A new monolithic thermal inkjet printhead using single crystalline silicon island as a heating resistor is proposed. The n(+) silicon island was fabricated by full isolation by porous oxidized silicon (FIPOS) using double diffusion. The heating resistor is thermally and electrically isolated from the silicon substrate by oxidizing the porous silicon; The fabricated thermal inkjet, printhead has a simple structure because high quality thermal oxide can be used as a passivation layer.
Publisher
KOREAN PHYSICAL SOC
Issue Date
1998-11
Language
English
Article Type
Article; Proceedings Paper
Citation

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.33, pp.458 - 461

ISSN
0374-4884
URI
http://hdl.handle.net/10203/76226
Appears in Collection
EE-Journal Papers(저널논문)RIMS Journal Papers
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