DISSOCIATIVE PHOTOIONIZATION OF BIS(DIMETHYL-MU-ISOPROPYLAMIDO-ALUMINUM) AND BIS(DIMETHYL-MU-T-BUTYLAMIDO-ALUMINUM) IN THE REGION HV=65-133 EV BY MASS-SPECTROMETRY
The dissociative photoionization studies of bis(dimethyl-mu-isopropylamido-aluminum) and bis(dimethyl-mu-t-butylamido-aluminum) in the photon energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence mass spectra are analyzed to understand the effects of Al:2p and Al:2s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.