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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication Lee, Je Gwon; Jung, Yeon Sik; Han, Sung-Hwan; Kim, Kwan-Mook; Han, Yang-Kyoo, ADVANCED MATERIALS, v.26, no.18, pp.2894 - 2900, 2014-05 | |
| Hierarchical Directed Self-Assembly of Diblock Copolymers for Modifi ed Pattern Symmetry Choi, Young Joo; Kim, Ju Young; Kim, Ji Eun; Mun, Jeong-Ho; Cha, Seung Keun; Kim, Sang Ouk, ADVANCED FUNCTIONAL MATERIALS, v.26, no.35, pp.6462 - 6470, 2016-09 | |
| Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns Jung, Yeon Sik; Ross, Caroline A., ADVANCED MATERIALS, v.21, no.24, pp.2540 - 2540, 2009-06 | |
| Tunable and rapid self-assembly of block copolymers using mixed solvent vapors Park, Woon Ik; Tong, Sheng; Liu, Yuzi; Jung, Il Woong; Roelofs, Andreas; Hong, Seungbum, NANOSCALE, v.6, no.24, pp.15216 - 15221, 2014 | |
| Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing Son, Jeong Gon; Chang, Jae-Byum; Berggren, Karl K.; Ross, Caroline A., NANO LETTERS, v.11, no.11, pp.5079 - 5084, 2011-11 | |
| Anomalous Rapid Defect Annihilation in Self-Assembled Nanopatterns by Defect Melting Kim, Bong Hoon; Park, So Jung; Jin, Hyeong Min; Kim, Ju Young; Son, Seung-Woo; Kim, Myung-Hyun; Koo, Chong Min; Shin, Jonghwa; Kim, Jaeup U.; Kim, Sang Ouk, NANO LETTERS, v.15, no.2, pp.1190 - 1196, 2015-02 | |
| Enhancing the Directed Self-assembly Kinetics of Block Copolymers Using Binary Solvent Mixtures Park, Woon Ik; Choi, Young Joong; Yun, Je Moon; Hong, Suck Won; Jung, Yeon Sik; Kim, Kwang Ho, ACS APPLIED MATERIALS INTERFACES, v.7, no.46, pp.25843 - 25850, 2015-11 | |
| Deep-Nanoscale Pattern Engineering by Immersion-Induced Self-Assembly Park, Woon Ik; Kim, Jong Min; Jeong, Jae Won; Jung, Yeon Sik, ACS NANO, v.8, no.10, pp.10009 - 10018, 2014-10 | |
| Block Copolymer with an Extremely High Block-to-Block Interaction for a Significant Reduction of Line-Edge Fluctuations in Self Assembled Patterns Kim, Jong Min; Hur, Yoon Hyung; Jeong, Jae Won; Nam, Tae Won; Lee, Jung Hye; Jeon, Kiung; Kim, YongJoo; Jung, Yeon Sik, CHEMISTRY OF MATERIALS, v.28, no.16, pp.5680 - 5688, 2016-08 |
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