$O_2/Cl_2$ ECR 플라즈마를 이용한 $RuO_2$ 박막의 건식 식각특성에 관한 연구 = Dry etching chacrateristics of $RuO_2$ thin film in $O_2/Cl_2$ electron cycl0tron resonance plasma

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Advisors
이원종researcherLee, Won-Jongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
113132/325007 / 000953113
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1997.2, [ [ii], 79 p. ]

Keywords

플라즈마식각; 염소플라즈마; $RuO_2$; $Cl_2$ plasma; ECR; Plasma etching

URI
http://hdl.handle.net/10203/50618
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113132&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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