Ta-base 비정질 박막의 Cu 확산 방지 특성에 관한 연구 = A study on the barrier property of Ta-base amorphous thin film against Cu diffusion

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 313
  • Download : 0
Advisors
박종욱researcherPark, Chong-Ookresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
143460/325007 / 000945306
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ x, 153 p. ]

Keywords

Ta-Si-N; Failure mechanism; Amorphous; Diffusion barrier; Cu metallization; 파괴기구; 탄탈륨-실리콘-질소; 비정질; 구리 배선; 확산방지막

URI
http://hdl.handle.net/10203/50343
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143460&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0