Ta-base 비정질 박막의 Cu 확산 방지 특성에 관한 연구A study on the barrier property of Ta-base amorphous thin film against Cu diffusion
- Advisors
- 박종욱researcher; Park, Chong-Ookresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1998
- Identifier
- 143460/325007 / 000945306
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ x, 153 p. ]
- Keywords
Ta-Si-N; Failure mechanism; Amorphous; Diffusion barrier; Cu metallization; 파괴기구; 탄탈륨-실리콘-질소; 비정질; 구리 배선; 확산방지막
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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