Ta-base 비정질 박막의 Cu 확산 방지 특성에 관한 연구 = A study on the barrier property of Ta-base amorphous thin film against Cu diffusion

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dc.contributor.advisor박종욱-
dc.contributor.advisorPark, Chong-Ook-
dc.contributor.author이윤직-
dc.contributor.authorLee, Yoon-Jik-
dc.date.accessioned2011-12-15T01:05:41Z-
dc.date.available2011-12-15T01:05:41Z-
dc.date.issued1998-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143460&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50343-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ x, 153 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectTa-Si-N-
dc.subjectFailure mechanism-
dc.subjectAmorphous-
dc.subjectDiffusion barrier-
dc.subjectCu metallization-
dc.subject파괴기구-
dc.subject탄탈륨-실리콘-질소-
dc.subject비정질-
dc.subject구리 배선-
dc.subject확산방지막-
dc.titleTa-base 비정질 박막의 Cu 확산 방지 특성에 관한 연구 = A study on the barrier property of Ta-base amorphous thin film against Cu diffusion-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN143460/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000945306-
dc.contributor.localauthor이윤직-
dc.contributor.localauthorLee, Yoon-Jik-
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MS-Theses_Ph.D.(박사논문)
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