DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 박종욱 | - |
dc.contributor.advisor | Park, Chong-Ook | - |
dc.contributor.author | 이윤직 | - |
dc.contributor.author | Lee, Yoon-Jik | - |
dc.date.accessioned | 2011-12-15T01:05:41Z | - |
dc.date.available | 2011-12-15T01:05:41Z | - |
dc.date.issued | 1998 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143460&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/50343 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ x, 153 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Ta-Si-N | - |
dc.subject | Failure mechanism | - |
dc.subject | Amorphous | - |
dc.subject | Diffusion barrier | - |
dc.subject | Cu metallization | - |
dc.subject | 파괴기구 | - |
dc.subject | 탄탈륨-실리콘-질소 | - |
dc.subject | 비정질 | - |
dc.subject | 구리 배선 | - |
dc.subject | 확산방지막 | - |
dc.title | Ta-base 비정질 박막의 Cu 확산 방지 특성에 관한 연구 | - |
dc.title.alternative | A study on the barrier property of Ta-base amorphous thin film against Cu diffusion | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 143460/325007 | - |
dc.description.department | 한국과학기술원 : 재료공학과, | - |
dc.identifier.uid | 000945306 | - |
dc.contributor.localauthor | 이윤직 | - |
dc.contributor.localauthor | Lee, Yoon-Jik | - |
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