펄스 마그테트론 스퍼터링 소스의 플라즈마 특성과 증착율에 대한 연구Characteristics of plasma and deposition rate in pulsed-DC magnetron sputtering source
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 장홍영 | - |
| dc.contributor.advisor | Chang, Hong-young | - |
| dc.contributor.author | 인정환 | - |
| dc.contributor.author | In, Jeong-hwan | - |
| dc.date.accessioned | 2011-12-14T07:25:31Z | - |
| dc.date.available | 2011-12-14T07:25:31Z | - |
| dc.date.issued | 2009 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=309038&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/47444 | - |
| dc.description | 학위논문(박사) - 한국과학기술원 : 물리학과, 2009. 2, [ v, 115 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | magnetron sputtering | - |
| dc.subject | pulsed-DC | - |
| dc.subject | ion bombardment energy | - |
| dc.subject | deposition rate | - |
| dc.subject | two step pulse | - |
| dc.subject | 마그네트론 스퍼터링 | - |
| dc.subject | 직류 펄스 | - |
| dc.subject | 이온 충돌 에너지 | - |
| dc.subject | 증착율 | - |
| dc.subject | 이단 펄스 | - |
| dc.title | 펄스 마그테트론 스퍼터링 소스의 플라즈마 특성과 증착율에 대한 연구 | - |
| dc.title.alternative | Characteristics of plasma and deposition rate in pulsed-DC magnetron sputtering source | - |
| dc.type | Thesis(Ph.D) | - |
| dc.identifier.CNRN | 309038/325007 | - |
| dc.description.department | 한국과학기술원 : 물리학과, | - |
| dc.identifier.uid | 020045225 | - |
| dc.contributor.localauthor | 인정환 | - |
| dc.contributor.localauthor | In, Jeong-hwan | - |
- Appears in Collection
- PH-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.