We constructed an Electron Beam Microcolumn (EBM) aligned by STM using silicon microfabricated electrostatic lenses. The system consists of an STM aligned field emitter, an extractor, an accelerator, a beam dump, a quadrupole deflector and an einzel lens. The system can be operated with the primary beam voltage from 0.2 to 1 kV, resulting in a sample current of 1 nA and the beam diameter of similar to 0.3 mu m when a sample was placed less than 2 mm away from the exiting einzel lens. The electron beam emission pattern was tested while aligning the tip to the hole of the lens and focusing the electron beam, revealing Fowler-Nordheim type I-V dependence and 1/f dominated noise.