Fabrication of multiple microcolumn array combined with field emission array

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We made a multiple electron microcolumn array. The electron source was made of either a Si based field emission array or a nickel coated array to keep the distances among sources equal. Laser micromachining was used to obtain a self-aligned microcolumn with five lenses: an extractor, an accelerator, and an Einzel lens. The aberration of each column was greatly improved compared to anodically bonded Si lens microcolumns. The field emission electron beam pattern was obtained from a multiple microcolumn. Its I-V dependence and possible application to the electron beam lithography with high throughput is discussed. (C) 1997 American Vacuum Society.
Publisher
American Institute of Physics
Issue Date
1997-11
Language
English
Article Type
Article; Proceedings Paper
Citation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.15, no.6, pp.2749 - 2753

ISSN
1071-1023
DOI
10.1116/1.589720
URI
http://hdl.handle.net/10203/281553
Appears in Collection
CH-Journal Papers(저널논문)
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