DC Field | Value | Language |
---|---|---|
dc.contributor.author | Gil, KH | ko |
dc.contributor.author | Lee, Seung Seob | ko |
dc.contributor.author | Youm, Y | ko |
dc.date.accessioned | 2008-01-14T12:03:29Z | - |
dc.date.available | 2008-01-14T12:03:29Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-03 | - |
dc.identifier.citation | MICROSYSTEM TECHNOLOGIES, v.7, no.1, pp.1 - 5 | - |
dc.identifier.issn | 0946-7076 | - |
dc.identifier.uri | http://hdl.handle.net/10203/2755 | - |
dc.description.abstract | The LIGA X-ray exposure step was modeled into three inequalities from exposure requirements. From these inequalities, equations for the minimum and maximum exposure times required for a good quality microstructure were obtained. An equation for the thickness of an X-ray mask absorber was also obtained from the exposure requirement of threshold dose deposition. A power function of photon energy, approximating the attenuation length of the representative LIGA resist, PMMA, and the mean photon energy of the X-rays incident upon an X-ray mask absorber were applied to the above mentioned equations. Consequently, the trends of the minimum and maximum exposure times with respect to mean photon energy of X-rays and thickness of PMMA were examined and an equation for the maximum exposable thickness of PMMA was obtained. The trends of the necessary thickness of a gold X-ray mask absorber with respect to photon energy of the X-rays and PMMA thickness ratio were also examined. The simplicity of the derived equations has clarified the X-ray exposure phenomenon and the interplay of exposure times, the attenuation coefficient and the thickness of an X-ray mask absorber, the attenuation coefficient and the thickness of a resist, and synchrotron radiation power density. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | SPRINGER-VERLAG | - |
dc.subject | LITHOGRAPHY | - |
dc.title | Equations of exposure time and X-ray mask absorber thickness in the LIGA process | - |
dc.type | Article | - |
dc.identifier.wosid | 000168099800001 | - |
dc.identifier.scopusid | 2-s2.0-0041905211 | - |
dc.type.rims | ART | - |
dc.citation.volume | 7 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 1 | - |
dc.citation.endingpage | 5 | - |
dc.citation.publicationname | MICROSYSTEM TECHNOLOGIES | - |
dc.identifier.doi | 10.1007/s005420000062 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Seung Seob | - |
dc.contributor.nonIdAuthor | Gil, KH | - |
dc.contributor.nonIdAuthor | Youm, Y | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.