DC Field | Value | Language |
---|---|---|
dc.contributor.author | Oh, DY | ko |
dc.contributor.author | Gil, K | ko |
dc.contributor.author | Chang, SS | ko |
dc.contributor.author | Jung, DK | ko |
dc.contributor.author | Park, NY | ko |
dc.contributor.author | Lee, Seung Seob | ko |
dc.date.accessioned | 2008-01-14T08:56:09Z | - |
dc.date.available | 2008-01-14T08:56:09Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-09 | - |
dc.identifier.citation | SENSORS AND ACTUATORS A-PHYSICAL, v.93, no.2, pp.157 - 161 | - |
dc.identifier.issn | 0924-4247 | - |
dc.identifier.uri | http://hdl.handle.net/10203/2743 | - |
dc.description.abstract | We present an oblique microstructure, a tetrahedral three-facet micro mirror, and its fabrication process with the inclined deep X-ray lithography (DXRL). The mirror has an equilateral triangular base of 100 mum length and mirror-like three side-facets inclined to the base at 45 degrees with knife edges. When two equilateral triangle patterns of gold absorber in the X-ray mask shade the PMMA (polymethylmethacrylate) substrate with two times of inclined DXRL at angles of 45 degrees and tan(-1)(2)degrees, the shaded part of PMMA produces a tetrahedral three-facet mirror. The process has been conducted with "a" X-ray mask without any alignments that may degrade the precision of microstructures. The completed tetrahedral mirror shows excellent aspects of mirror-like facets and knife-edges with a surface roughness of 20-30 nm. By changing the gap distance between the X-ray mask and the PMMA substrate, the size of the three-facet mirror can be controlled. The three-facet micro mirror is devised as a three-directional laser beam reflector for the measurement of 6 d.f. motion of the slider flying on a magnetic disk of a hard disk driver (HDD). (C) 2001 Elsevier Science B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | SYNCHROTRON-RADIATION | - |
dc.subject | LITHOGRAPHY | - |
dc.title | A tetrahedral three-facet micro mirror with the inclined deep X-ray process | - |
dc.type | Article | - |
dc.identifier.wosid | 000171079000009 | - |
dc.identifier.scopusid | 2-s2.0-0035975555 | - |
dc.type.rims | ART | - |
dc.citation.volume | 93 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 157 | - |
dc.citation.endingpage | 161 | - |
dc.citation.publicationname | SENSORS AND ACTUATORS A-PHYSICAL | - |
dc.identifier.doi | 10.1016/S0924-4247(01)00645-8 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Seung Seob | - |
dc.contributor.nonIdAuthor | Oh, DY | - |
dc.contributor.nonIdAuthor | Gil, K | - |
dc.contributor.nonIdAuthor | Chang, SS | - |
dc.contributor.nonIdAuthor | Jung, DK | - |
dc.contributor.nonIdAuthor | Park, NY | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | LIGA | - |
dc.subject.keywordAuthor | tetrahedral three-facet micro mirror | - |
dc.subject.keywordAuthor | inclined deep X-ray lithography (inclined DXRL) | - |
dc.subject.keywordAuthor | hard disk driver (HDD) slider | - |
dc.subject.keywordPlus | SYNCHROTRON-RADIATION | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
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