DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, KC | ko |
dc.contributor.author | Lee, Seung Seob | ko |
dc.date.accessioned | 2008-01-14T08:46:06Z | - |
dc.date.available | 2008-01-14T08:46:06Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-04 | - |
dc.identifier.citation | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, v.11, no.4-5, pp.358 - 364 | - |
dc.identifier.issn | 0946-7076 | - |
dc.identifier.uri | http://hdl.handle.net/10203/2740 | - |
dc.description.abstract | We present a deep X-ray mask with integrated bent-beam electrothermal actuator for the fabrication of 3D microstructures with curved surface. The mask absorber is electroplated on the shuttle mass, which is supported by a pair of 20-mu m-thick single crystal silicon bent-beam electrothermal. actuators and oscillated in a rectilinear direction due to the thermal expansion of the bent-beams. The width of each bent-beam is 10 mu m or 20 mu m and the length and bending angle are 1 mm and 0.1 rad, respectively, and the shuttle mass size is 1 mm X 1 mm. For 10-mu m-wide bent-beams, the shuttle mass displacement is around 15 mu m at 180 mW (3.6 V) dc input power. For 20-mu m-wide bent-beams, the shuttle mass displacement is around 19 mu m at 336 mW (4.2 V) dc input power. Sinusoidal cross-sectional PMMA microstructures with a pitch of 40 mu m and a height of 20 mu m are fabricated by 0.5 Hz, 20-mu m-amplitude sinusoidal shuttle mass oscillation. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | SPRINGER | - |
dc.subject | MODIFIED LIGA PROCESS | - |
dc.subject | MICROFABRICATION | - |
dc.subject | FABRICATION | - |
dc.subject | MICROLENSES | - |
dc.title | Deep X-ray lithography using mask with integrated electrothermal actuator | - |
dc.type | Article | - |
dc.identifier.wosid | 000228969900025 | - |
dc.identifier.scopusid | 2-s2.0-21044457237 | - |
dc.type.rims | ART | - |
dc.citation.volume | 11 | - |
dc.citation.issue | 4-5 | - |
dc.citation.beginningpage | 358 | - |
dc.citation.endingpage | 364 | - |
dc.citation.publicationname | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Seung Seob | - |
dc.contributor.nonIdAuthor | Lee, KC | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | MODIFIED LIGA PROCESS | - |
dc.subject.keywordPlus | MICROFABRICATION | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MICROLENSES | - |
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