Study on the amorphous Ta2O5 thin film capacitors deposited by dc magnetron reactive sputtering for multichip module applications

Tantalum oxide (Ta2O5) thin film capacitors for multichip module (MCM) applications were investigated. Through the capacitor characterization and RBS compositional analysis, it was found that when the sputtering power and Ar flow rate is 200 W and 60 seem, respectively, the stoichiometric Ta2O5 film can be obtained at the O2 gas flow rate of 50 seem. The low temperature annealing (150°C) is useful to increase the capacitor yield, but the annelaing in oxygen atmosphere causes the leakage current to increase. When the Ta-oxide capacitors were fabricated on the polymer-laminated substrate, leakage current increased and breakdown field strength decreased. These are due to the surface roughness effects of the polymer films and also the Al bottom electrode layer. It was demonstrated that the Ta2O5 capacitors fabricated on the Upilex-S polymer film can meet the requirements of integrated capacitors for MCM applications. ? 1999 Elsevier Science S.A. All rights reserved.
Publisher
Elsevier BV
Issue Date
1999-12
Language
ENG
Citation

MATERIALS SCIENCE & ENGINEERING B: SOLID-STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.67, no.3, pp.108 - 112

ISSN
0921-5107
URI
http://hdl.handle.net/10203/2727
Appears in Collection
MS-Journal Papers(저널논문)
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