Alignment of nematic liquid crystals on the high resolution ITO nano pattern with high resolution formed by the secondary sputtering lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jung, HeeTae | ko |
| dc.contributor.author | 전환진 | ko |
| dc.contributor.author | 정현수 | ko |
| dc.date.accessioned | 2019-04-16T01:10:29Z | - |
| dc.date.available | 2019-04-16T01:10:29Z | - |
| dc.date.created | 2013-06-25 | - |
| dc.date.issued | 2012-08-20 | - |
| dc.identifier.citation | 24th International Liquid Crystal Conference | - |
| dc.identifier.uri | http://hdl.handle.net/10203/259527 | - |
| dc.language | English | - |
| dc.publisher | German Chemical Society | - |
| dc.title | Alignment of nematic liquid crystals on the high resolution ITO nano pattern with high resolution formed by the secondary sputtering lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 24th International Liquid Crystal Conference | - |
| dc.identifier.conferencecountry | GE | - |
| dc.contributor.localauthor | Jung, HeeTae | - |
| dc.contributor.nonIdAuthor | 전환진 | - |
| dc.contributor.nonIdAuthor | 정현수 | - |
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