Temperature-dependent thermomechanical noise spectra of doped silicon microcantilevers

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This paper reports temperature-dependent thermomechanical noise spectra of boron-doped silicon microcantilevers over the temperature range of 25-175 degrees C and cantilever power up to 75 mW. Either local heating from integrated solid state resistors or uniform heating on a hotplate were employed. Using a cantilever with oxide residue, the temperature coefficient of the resonance frequency was 1.10 X 10(-4)degrees C-1 for uniform heating and 2.84 x 10(-4)degrees C-1 for local heating. Local heating thus modulated the resonance frequency more dramatically than uniform heating. For the oxide-coated cantilever, the cantilever resonance frequency increased with increasing temperature. However, when the oxide was removed, the resonance frequency decreased with increasing temperature. By employing two cantilever types having different doped resistors, three different thermal loadings characterized by the temperature gradient were investigated. When the highest temperature was at the cantilever base, the cantilever mechanical properties were more highly affected than when the highest temperature was at the cantilever free end. (c) 2007 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE SA
Issue Date
2008-07
Language
English
Article Type
Article; Proceedings Paper
Keywords

ATOMIC-FORCE MICROSCOPE; DATA-STORAGE; MANIPULATION; CANTILEVERS; FABRICATION; RESONANCE; SENSORS; HEATERS; DESIGN; PROBES

Citation

SENSORS AND ACTUATORS A-PHYSICAL, v.145, pp.37 - 43

ISSN
0924-4247
DOI
10.1016/j.sna.2007.10.028
URI
http://hdl.handle.net/10203/245490
Appears in Collection
ME-Journal Papers(저널논문)
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