Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 mu m-thick submicron patterns with an aspect ratio over 100

This is the first report on the fabrication of defect-free submicron structures with more than 100 mu m thickness and an aspect ratio over 100. Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP) was synthesized via radical polymerization. The mechanical properties of the PGP submicron structure displayed a Young's modulus of 6.09 GPa and a hardness of 0.16 GPa, 4.2 and 8 times, respectively, than those of SU8 nanopatterns. These enhancements enable the utilization of ultrathick 2D-/3D-submicron structures as an ideal platform for microelectromechanical systems, big data storage systems, energy devices, etc.
Publisher
ROYAL SOC CHEMISTRY
Issue Date
2017-07
Language
English
Keywords

POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; INTERFERENCE LITHOGRAPHY; PHOTONIC CRYSTALS; NANOPARTICLES; NANOPATTERNS; FILMS

Citation

CHEMICAL COMMUNICATIONS, v.53, no.58, pp.8172 - 8175

ISSN
1359-7345
DOI
10.1039/c7cc02937c
URI
http://hdl.handle.net/10203/225219
Appears in Collection
EEW-Journal Papers(저널논문)
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