Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 mu m-thick submicron patterns with an aspect ratio over 100

Abstract

This is the first report on the fabrication of defect-free submicron structures with more than 100 mu m thickness and an aspect ratio over 100. Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP) was synthesized via radical polymerization. The mechanical properties of the PGP submicron structure displayed a Young's modulus of 6.09 GPa and a hardness of 0.16 GPa, 4.2 and 8 times, respectively, than those of SU8 nanopatterns. These enhancements enable the utilization of ultrathick 2D-/3D-submicron structures as an ideal platform for microelectromechanical systems, big data storage systems, energy devices, etc.