DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeon, Hwan-Jin | ko |
dc.contributor.author | Kim, Ju Young | ko |
dc.contributor.author | Jung, Woo Bin | ko |
dc.contributor.author | Jeong, Hyeon-Su | ko |
dc.contributor.author | Kim, Yun Ho | ko |
dc.contributor.author | Shin, Dong Ok | ko |
dc.contributor.author | Jeong, Seong-Jun | ko |
dc.contributor.author | Shin, Jonghwa | ko |
dc.contributor.author | Kim, Sang Ouk | ko |
dc.contributor.author | Jung, Hee-Tae | ko |
dc.date.accessioned | 2016-12-01T04:51:01Z | - |
dc.date.available | 2016-12-01T04:51:01Z | - |
dc.date.created | 2016-11-21 | - |
dc.date.created | 2016-11-21 | - |
dc.date.issued | 2016-10 | - |
dc.identifier.citation | ADVANCED MATERIALS, v.28, no.38, pp.8439 - 8445 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | http://hdl.handle.net/10203/214445 | - |
dc.description.abstract | High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | QUANTUM DOTS | - |
dc.subject | LARGE-AREA | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | ARRAYS | - |
dc.subject | TEMPLATES | - |
dc.subject | PATTERNS | - |
dc.subject | GRAPHENE | - |
dc.subject | GOLD | - |
dc.title | Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly | - |
dc.type | Article | - |
dc.identifier.wosid | 000386103700013 | - |
dc.identifier.scopusid | 2-s2.0-84990221214 | - |
dc.type.rims | ART | - |
dc.citation.volume | 28 | - |
dc.citation.issue | 38 | - |
dc.citation.beginningpage | 8439 | - |
dc.citation.endingpage | 8445 | - |
dc.citation.publicationname | ADVANCED MATERIALS | - |
dc.identifier.doi | 10.1002/adma.201602523 | - |
dc.contributor.localauthor | Shin, Jonghwa | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
dc.contributor.localauthor | Jung, Hee-Tae | - |
dc.contributor.nonIdAuthor | Jeong, Hyeon-Su | - |
dc.contributor.nonIdAuthor | Kim, Yun Ho | - |
dc.contributor.nonIdAuthor | Shin, Dong Ok | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | block copolymers | - |
dc.subject.keywordAuthor | high aspect ratio | - |
dc.subject.keywordAuthor | high resolution | - |
dc.subject.keywordAuthor | plasma reaction | - |
dc.subject.keywordAuthor | secondary sputtering | - |
dc.subject.keywordPlus | QUANTUM DOTS | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | TEMPLATES | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | GRAPHENE | - |
dc.subject.keywordPlus | GOLD | - |
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