Effect of hydrogen on dynamic charge transport in amorphous oxide thin film transistors

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Hydrogen in zinc oxide based semiconductors functions as a donor or a defect de-activator depending on its concentration, greatly affecting the device characteristics of oxide thin-film transistors (TFTs). Thus, controlling the hydrogen concentration in oxide semiconductors is very important for achieving high mobility and minimizing device instability. In this study, we investigated the charge transport dynamics of the amorphous semiconductor InGaZnO at various hydrogen concentrations as a function of the deposition temperature of the gate insulator. To examine the nature of dynamic charge trapping, we employed short-pulse current-voltage and transient current-time measurements. Among various examined oxide devices, that with a high hydrogen concentration exhibits the best performance characteristics, such as high saturation mobility (10.9 cm(2) v(-1) s(-1)), low subthreshold slope (0.12 V/dec), and negligible hysteresis, which stem from low defect densities and negligible transient charge trapping. Our finding indicates that hydrogen atoms effectively passivate the defects in subgap states of the bulk semiconductor, minimizing the mobility degradation and threshold voltage instability. This study indicates that hydrogen plays a useful role in TFTs by improving the device performance and stability
Publisher
IOP PUBLISHING LTD
Issue Date
2016-08
Language
English
Article Type
Article
Keywords

LOW-FREQUENCY NOISE; SEMICONDUCTORS; PERFORMANCE; DIELECTRICS; VOLTAGE; STRESS

Citation

NANOTECHNOLOGY, v.27, no.32

ISSN
0957-4484
DOI
10.1088/0957-4484/27/32/325203
URI
http://hdl.handle.net/10203/214301
Appears in Collection
MS-Journal Papers(저널논문)EE-Journal Papers(저널논문)
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