Simple patterning of cells on a biocompatible nonchemically amplified resist

Abstract

A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photo-resist material was successfully used for cell patterning. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film where carboxylic groups were present.